Kinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungsten

dc.contributor.author	Gokce, Huseyin	en
dc.date.accessioned	2015-05-12T20:51:33Z
dc.date.available	2015-05-12T20:51:33Z
dc.date.issued	1991	en
dc.identifier.uri	https://scholarworks.montana.edu/xmlui/handle/1/6869	en
dc.language.iso	en	en
dc.publisher	Montana State University - Bozeman, College of Engineering	en
dc.subject.lcsh	Tungsten	en
dc.subject.lcsh	Vapor-plating	en
dc.subject.lcsh	Silane	en
dc.title	Kinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungsten	en
dc.type	Dissertation	en
dc.rights.holder	Copyright 1991 by Huseyin Gokce	en
thesis.catalog.ckey	292836	en
thesis.degree.department	Chemical & Biological Engineering.	en
thesis.degree.genre	Dissertation	en
thesis.degree.name	PhD	en
thesis.format.extentfirstpage	1	en
thesis.format.extentlastpage	246	en