Kinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungsten

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dc.contributor.authorGokce, Huseyinen
dc.date.accessioned2015-05-12T20:51:33Z
dc.date.available2015-05-12T20:51:33Z
dc.date.issued1991en
dc.identifier.urihttps://scholarworks.montana.edu/handle/1/6869en
dc.language.isoenen
dc.publisherMontana State University - Bozeman, College of Engineeringen
dc.rights.holderCopyright 1991 by Huseyin Gokceen
dc.subject.lcshTungstenen
dc.subject.lcshVapor-platingen
dc.subject.lcshSilaneen
dc.titleKinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungstenen
dc.typeDissertationen
thesis.catalog.ckey292836en
thesis.degree.departmentChemical & Biological Engineering.en
thesis.degree.genreDissertationen
thesis.degree.namePhDen
thesis.format.extentfirstpage1en
thesis.format.extentlastpage246en

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